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    Accelerating Manufacturing Productivity with the 450mm Transition

      Tom Jefferson, ISMI 450mm Program Manager
     Jan 13, 2009
    Description:

    Mission: Enable cost-effective 450 mm transition through coordination and development of infrastructure, guidance, and industry readiness. Creation of testable Next Generation Factory Architecture guidelines and coordination of standards to accelerate 450 mm. Prototype testing of 450 mm Factory Integration Equipment. Phased Approach for Test Wafer Generation Strategy. Obtain blanket thin film deposition on ISMI wafers and the ability to measure films & capability for oxide patterning cell.

    Important Tags: Obtain blanket thin film deposition on ISMI wafers and the ability to measure films & capability
    Views: 2460
    Domain: Electronics
    Category: Semiconductors


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