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    Enabling Micro-Contamination Control Collaboration Yield Enhancement

      Archita Sengupta
     Mar 3, 2016
    Description:

    HVM Requirements: Less Start Up Time- Less Flushing for initial particles and metal ions extraction, Always Up and Running tools/Chemical Delivery Systems; Less Process Down Time: Productivity Improvement- Reduce excursion of particles/metal ions, Environmental Control (No adders from components); Meet “On wafer” Defectivity Baseline (Process/Materials/Equipment)- Smaller particles, Metal ions, Organics/NVR; Consistency and Quality Control of all the products for HVM use- Across Supply Chain.

    Important Tags: Metrology Techniques, Metal Ions, Chemical Delivery Systems, Productivity Improvement, Lithography Defects
    Views: 3284
    Domain: Electronics
    Category: Semiconductors


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