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    EUV Mask Substrate Readiness For Sub 10 nm HP Nodes

      Abbas Rastegar
     Sep 9, 2018
    Description:

    EUV mask blank performance is determined by many interdependent parameters of a substrate that need to be optimized simultaneously.

    Important Tags: EUV Mask Substrate, Applied Materials, Substrate development
    Views: 2126
    Domain: Electronics
    Category: Semiconductors


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