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    Metallization - Deposition and Etching

      Chemical Engineering - IIT Bombay
     Jul 5, 2017

    Needs independently controlled thermal and/or electron beam sources for all materials and dopants. Evaporation at very low deposition rates. Typically in ultra-high vacuum. Very well controlled, Grow films with the good crystal structure. Expensive. Often use multiple sources to grow alloy films. Deposition rate is so low that substrate temperature does not need to be as high

    Important Tags: electron beam, Ultra-High Vacuum, Deposition and Etching
    Views: 1716
    Domain: Electronics
    Category: Semiconductors

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