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    Percolation Model of the Stochastic Effect of EUV Resists

      Akira Sasaki, Masahiko Ishino, Masaharu Nishikino, Yasunari Maekawa
     Sep 6, 2018
    Description:

    Properties of exposure and development of EUV resists based on metal nanoparticles are investigated using a simple, general method of statistical mechanics.

    Important Tags: EUV Resists, EUV lithography, EUV Photon
    Views: 1841
    Domain: Electronics
    Category: Semiconductors


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