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    Semiconductor Industry Metrology Challenges

      Seung-Ki Chae, VP Memory Division, Semiconductor Business, Samsung Electronics
     Jan 7, 2009
    Description:

    Semiconductor development of nano-scale in-situ metrology for dry-etch, CVD : plasma, and vacuum process-equipment. Diffusion thermal heat transfer CMP, Wet Cleaning fluid flow. Wafer metrology in the manufacturing process. Thin-film thickness standard and measurement. Particle standard measurement and analysis. Physical, structure and surface analysis application of the analytical metrology. Impurity measurement in process gas and chemical contamination measurements in clean-room.

    Important Tags: Impurity measurement in process gas and chemical contamination measurements in clean-room.
    Views: 1992
    Domain: Electronics
    Category: Semiconductors


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