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    The Final Frontiers of Lithography Manufacturing

      Jang Fung Chen
     Dec 2, 2009
    Description:

    Topics discussed include: Lithography Manufacturing beyond 22nm, ArFi Double Patterning (DP), SMO and Contact hole imaging, EUV, Alternative Lithography Manufacturing, Massively Parallel e-Beam, Nanoimprint, Through Silicon Vias (TSV), Moore’s Law & Lithography Manufacturing Roadmap.

    Important Tags: Lithography Manufacturing, 22nm, Double Patterning, SMO, EUV, semiconductors
    Views: 2452
    Domain: Electronics
    Category: Semiconductors


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