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    Which Lithography Technology for the 16nm, 11nm, and 8nm Logic Nodes

      Dr. Burn Lin
     Nov 9, 2010
    Description:

    Lithography, Multiple Patterning in ArF Immersion Lithography, EUV Lithography, EUV Illuminator and Imaging Lens On, EUVL, High-NA EUV Design Solutions, Determination of EUV DOF, Multiple E-Beam Mask less Lithography, MAPPER 5keV MEB DW System, Reflective E-Beam Lithography, Multiple-E-Beam Results, Data Rate of Mask less Systems, CD Tolerance Considerations.

    Important Tags: Lithography, Multiple Patterning in ArF Immersion Lithography, EUV Lithography, EUV Illuminator
    Views: 3872
    Domain: Electronics
    Category: Semiconductors


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